Abstract
Titanium oxide films were deposited on unheated glass substrates by using inductively coupled plasma assisted reactive direct current magnetron sputtering. X-ray diffraction, X-ray photoelectron spectroscopy and field emission scanning electron microscope were used to analyze film structure, composition and morphology. Analysis results revealed the formation of titanium monoxide film rather than titanium dioxide film. Golden yellow nanocrystalline titanium monoxide film with a very high degree of crystallinity was formed under metallic mode of sputtering at lower temperature of <200 °C. Annealing of the golden yellow titanium monoxide film at 600 °C in the open air changed film structure to include rutile-type titanium dioxide.
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