Abstract
The reactive chemical vapor deposition of tantalum carbides on a carbon material has been studied experimentally and theoretically. Thermodynamic modeling of heterogeneous equilibria in the Ta–C–F system in wide temperature and pressure ranges has shown that the chemical transport of tantalum through the vapor phase under isothermal conditions is mediated by lower tantalum fluorides. It is determined that, with increasing deposition time, the composition of the carbide coating shifts to the lower boundary of the homogeneity range of the carbide. The carbide coatings obtained at 1300 K are rather homogeneous and consist of nanograins.
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