Abstract
Plasma display panel is one of the most potential flat devices for large-size displays. Magnesium oxide thin films have been used as a protective layer to improve discharge characteristics and the lifetime of panel. So magnesium oxide thin film is worthy to be studied. Magnesium oxide thin films were prepared by e-beam gun evaporation at a substrate temperature of 200°C. Heat annealing treatment and ion assisted deposition effect on thin films were investigated. The relation between these characteristics of films has been studied. The characteristics of the deposited films, including optical properties, crystalline structure, and microstructure were discussed.
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