Abstract
A series of Ti–Si–N coatings with 0 < Si < 20 at.% were synthesized by inductively coupled plasma assisted vapor deposition. Coating composition, structure, atomic short-range order, and mechanical response were characterized by Rutherford backscattering spectrometry, transmission electron microscopy, x-ray absorption near-edge structure spectroscopy, and instrumented nanoindentation. These experiments show that the present series of Ti–Si–N coatings consists of a mixture of nanocrystalline titanium nitride (TiN) and amorphous silicon nitride (a-Si:N); i.e., they are TiN/a-Si:N ceramic/ceramic nanocomposites. The hardness of the present series of coatings was found to be less than 32 GPa and to vary smoothly with the Si composition.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.