Abstract

AbstractStructural and mechanical properties of nanoscale TiN/Cu multilayers grown by dual ion beam sputtering with bilayer periods (A) ranging from 2.5 to 50 nm were studied. Both low-angle and high-angle X-ray diffraction (XRD) experiments have been employed to globally characterize the multilayers structure. The microstructure of the multilayers has been scrutinized by high resolution transmission electron microscopy (HRTEM). The effects of interface and bilayer thickness on hardness were investigated by depth-sensing nanoindentation technique. A small hardness increase with decreasing periodicity of the multilayers has been observed. The relationship between the hc/T ratio (hc is the contact depth and T is the total film thickness) and the hardness is established. The correlation between the microstructure and hardness is discussed.

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