Microstructure and Magneto-Optical Properties of TbFeCo Films Prepared by Facing Targets Sputtering

Abstract

ABSTRACTThe microstructure of TbFeCo amorphous films deposited by a facing targets type of sputtering (FTS) method varied with the change of deposition rate Rd. The films deposited at Rd of about 100–200 nm/min did not present any distinguishable columnar structure while the ones at Rd of about 50 nm/min revealed obvious columnar structure. The films with columnless structure exhibited Kerr rotation angle θk of 0.37 deg. of which the value was higher than that of the films with columnar structure over the wide range of Th content. The torque measurement implied that the presence of columnar structure was not mainly necessary for the occurrence of large perpendicular magnetic anisotropy. Under satisfactory confinement of plasma during sputtering, the dense, uniform and columnless TbFeCo films can be obtained on plasma-free substrate even at Rd as high as 200 nm/min, without destroying the excellent magnetic properties and magneto-optical characteristics.