Abstract
High-resolution electron microscopy has been used to study the microstructural properties of top and bottom magnetic tunnel junctions. Different physical properties have been found for the two configurations, and they have been interpreted in terms of microstructural features. All physical parameters favor the bottom configuration except for the coupling field, which is higher for the bottom structure. This latter result has been explained by the more pronounced roughness at the interfaces between the electrodes and the insulator film.
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