Abstract
Monolithic TiB2 and TiB2–5 wt% Si3N4 ultrahigh temperature ceramics were fabricated by spark plasma sintering (SPS) at 1900 °C for 7 min under 40 MPa. The addition of Si3N4 as a sintering aid had a remarkable impact on the microstructure development of TiB2-based ceramic. X-ray diffraction (XRD) analysis and microstructural investigations verified the formation of BN nano-platelets, TiN and SiO2 in the Si3N4-doped TiB2 sample via chemical reactions of Si3N4 with the oxide impurities (TiO2 and B2O3) present on the surface of TiB2 particles. The removal of surface oxide layers significantly prevented the extreme grain growth of TiB2 matrix, which resulted in improved sinterability and relatively finer microstructure. Moreover, the formation of SiO2 promoted the densification through the liquid phase sintering mechanism.
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