Abstract
The microstructure of electrodeposited Co-P films was investigated using transmission electron microscopy (TEM). The use of ultramicrotomy for sample preparation made it possible to obtain cross sections parallel to the growth direction of the film. Co-P films deposited under constant current conditions are amorphous and no nonuniformity could be identified at a scale of a few to a few tens of nanometers. This is in contradiction with the often made assumption that Co-P electrodeposited under constant current conditions has a columnar microstructure. Co-P layers electrodeposited in pulsed current conditions show a clear multilayer structure. © 2004 The Electrochemical Society. All rights reserved.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
