Abstract
Microstructural modifications resulting from time dependent variations of the bias voltage during the deposition of thin hard coatings are discussed. TiN-coatings are produced by reactive magnetron sputtering in several modes: (a) stepwise increase of the bias voltage during the deposition, (b) alternating sputtering with and without substrate voltage and (c) pulsed bias voltage. On the basis of X-ray diffraction measurements , it is demonstrated that residual stress gradients and texture gradients can be designed tailor-made. Furthermore, results of microhardness measurements and scratch tests indicate an improvement of the mechanical properties , especially for the application of a pulsed bias voltage.
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