Abstract
Cosputtering has been used to manufacture nanocomposite thin films of Ag particles embedded in amorphous SiO 2, nanocrystalline ZnO and amorphous Si. A combination of X-ray diffractometry, high resolution and conventional transmission electron microscopy and electron probe microanalysis has been used to characterize the microstructures of the nanocomposite thin films. In cosputtered nanocomposite AgSiO 2, AgZnO and AgSi thin films the Ag particles are typically 5–25 nm in size.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
