Abstract
Direct metal deposition (DMD) technology is a laser-aided rapid prototyping method that can be used to fabricate near net shape components from their CAD files. In the present study, a series of Al-Si samples have been deposited by DMD in order to optimize the laser deposition parameters to produce high quality deposit with minimum porosity and maximum deposition rate. This paper presents the microstructural evolution of the as-deposited Al 4047 sample produced with optimized process parameters. Optical, scanning, and transmission electron microscopes have been employed to characterize the microstructure of the deposit. The electron backscattered diffraction method was used to investigate the grain size distribution, grain boundary misorientation, and texture of the deposits. Metallographic investigation revealed that the microstructural morphology strongly varies with the location of the deposit. The layer boundaries consist of equiaxed Si particles distributed in the Al matrix. However, a systematic transition from columnar Al dendrites to equiaxed dendrites has been observed in each layer. The observed variation of the microstructure was correlated with the thermal history and local cooling rate of the melt pool.
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