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Abstract
Black-monoclinic oxygen defective HfO2-x film with about 5 μm in a thickness was successfully formed on the surface of a metal Hf plate by controlled heat treatment in air. The black-monoclinic oxygen defective HfO2-x film was transformed into white body by further oxidation at higher temperature. Tauc plots using diffuse reflection data showed that impurity levels were formed within the energy gap for the black-monoclinic HfO2-x thin films. Based on the XPS analyses, the oxygen vacancy brought about the impurity levels. No cracks and voids were observed for the black-monoclinic HfO2-x films consisting of the fine columnar grains with the dimension of diameters of about 50 nm and lengths ranging from a few hundred nm to 1 μm.
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