Abstract
The large-scale homogeneous fluorine-doped tin oxide (SnO2:F) thin film was successfully deposited on glass by atmospheric pressure chemical vapor deposition (APCVD) method on an industrial production line. XRD, SEM and TEM were employed to investigate the film morphological and microstructural variation. It was observed for the first time that the as-deposited SnO2:F thin film presented a typical micro-nano structure, of which the micro-sized grains (100–300nm) were assembled by nano-sized crystallites (<10nm). It was found that the post-heating for 20min at ∼580°C or above induced splitting phenomenon of the micro-sized polyhedron-like grains into the smaller ones. Meanwhile, the increased grain boundaries due to such process were found to lead a dramatic decrease in the Hall mobility and distinguishable increase in the sheet resistance. Therefore, it was confirmed that such large-scale low-emission glass can serve with good functional properties below 580°C.
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