Abstract
The possibility of µ-XPS (microscopic X-ray photoelectron spectroscopy) analysis using a focused X-ray has been demonstrated in a synchrotron radiation beamline. A Wolter type mirror produced a focused 150 eV X-ray with a beam size ranging from 23(sagittal)×36(meridional) µm2 to 1.4×20 µm2. The meridional beam size was always larger than the sagittal one due to the figure displacement of the mirror surface. When the focused beam was used for µ-XPS analysis of Si and Al samples, the Si(2p) and Al (2p) XPS spectra indicating native oxides on the sample surface could be clearly observed with energy resolutions of 1.7 to 2.8 eV. For practical µ-XPS analysis in the micrometer to sub-micrometer range, the fabrication accuracy of the mirror should be improved and the photon flux to the sample surface has to be increased.
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