Micropowder blasting with nanoparticles dispersed polymer mask for rapid prototyping of glass chip

Abstract

We present a new rapid prototyping technique without a photolithography step to produce a glass chip with high aspect ratio channel for a micro total analysis system (µTAS). This technique consists of a powder blasting technique and direct laser patterning of Au nanoparticles dispersed polymer mask technique, and is useful in the development stage of a glass chip. The mask thickness and powder blasting condition were optimized for the fabrication of a glass chip with a higher aspect ratio channel. Under the optimized processing condition, the microchannel with a maximum aspect ratio of 2.1 in a glass substrate was successfully realized. The proposed technique was applied to a glass chip for electrophoresis and its performance for DNA separation analysis was confirmed.