Abstract
We report on the design, fabrication, and simulation of a four-state pixelated subwavelength optical device that enables mid-wave infrared (MWIR) or long-wave infrared (LWIR) snapshot polarimetric imaging. The polarization information can help to classify imaged materials and identify objects of interest for remote sensing and military applications. The fabricated pixelated polarizers have measured extinction ratios larger than 100:1 for pixel sizes greater than 9 microns by 9 microns, with transmitted signals greater than 50%. That exceeds, by 7 times, previously reported device extinction ratios for 15 micron by 15 micron pixels. Traditionally, sequential polarimetric imaging sensors produce scenes with polarization information through a series of assembled images. Snapshot polarimetric imaging collects the spatial distribution of all four Stokes' parameters simultaneously. In this way any noise due to scene movement from one frame to the next is eliminated. In this paper, we will quantify near-field and diffractive effects of the finite pixel apertures upon detection. We have designed and built an experimental setup that models a pixel within a focal plane array (FPA) to measure crosstalk from adjacent gold wiregrid micropolarizers. This configuration simulates a snapshot polarization imaging device where the two substrates are stacked; micropolarizer array substrate on top of an FPA. Modeling and measured data indicate crosstalk between the adjacent pixels up to a few microns behind the polarizer plane. Crosstalk between adjacent pixels increases uncertainty in the measured polarization states in a scene of interest. Measured and simulated data confirm that the extinction ratio of a micropolarizer pixel in a super-cell will be reduced by 17% when moving the FPA from 0.5 microns to 1.0 microns away from the polarizer. These changes in extinction ratio are significant since typical glue separation is on the order of 10 microns.
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