Abstract

Plasma redistribution in a symmetric microchannel-cavity hybrid structure device has been investigated by modulating the applied electric field strength. The device array has been operated in 200 Torr of argon, driven by a 20 kHz bipolar waveform. With the existence of the intervening microchannel between microcavities, several stable modes of operation of the microplasma have been observed, including cavity mode, hybrid mode and channel mode. Transition between the modes occurs with modulation of the applied voltage from 800 to 1100 V. The characteristics of microplasma propagation in different modes are investigated and the propagation speed along diagonal direction of the device in cavity mode, hybrid and channel mode are calculated to be ~48, ~29 and ~32 km s−1, respectively. Nonhomogeneous electric field strength distribution and plasma interaction have been discussed to explain these experimental results. Emission intensity and propagation speed differences in the cavity mode between the polarities of the applied voltage are interpreted through spatially resolved measurements of the emission profile in a partial channel-cavity array.

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