Abstract
AbstractThe study of screening a microparticle charge in a plasma taking into account sinks of electrons and ions to the microparticle and bulk processes of their production and loss in a plasma is reported. The research objective is to investigate the effect of the conversion of atomic ions Ar+ to molecular ones Ar2+ on character of screening in a plasma with an external ionization source. It is determined that the plasma due to the ion conversion consists of two positive ion species. This circumstance leads to the three‐exponential charge screening, moreover there exists a region of plasma parameters where all the screening constants have comparable values. Numerical simulation of microparticle charging on the basis of the drift‐diffusion approach is performed and comparison of the obtained data with the analytical results is fulfilled (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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