Micro/nanoimprinting of glass under high temperature using a CVD diamond mold

Abstract

For micro/nanoimprinting of glass, the appropriate combination of glass and mold material was clarified by an adhesion test using chemical vapor deposition (CVD) diamond, silicon, glassy carbon and sintered nitride ceramics as the mold material, and Pyrex, TEMPAX and BK7 as the glass material. The result of the adhesion test shows that CVD diamond is suitable for imprinting with a wide variety of glass materials under various temperature conditions. The method of fabricating the CVD diamond mold using focused ion beam (FIB) was examined, and it was clarified that the grain boundary of CVD diamond has little effect on the surface condition. Glass micro/nanoimprinting was performed using the CVD diamond mold. The effect of the molding conditions, such as the molding temperature and mold-release temperature, on the height of glass transcription was clarified. The effects of pattern size and shape were also investigated. On the basis of the results, a method of selecting the molding conditions to obtain the desired transcript height was developed. In this research, the entire flow of glass micro/nanoimprinting, including mold material selection, the mold fabrication process and molding process, was proposed experimentally, and the selection method of the molding conditions was shown.