Abstract
AbstractMicromorphology and nanoindentation properties of sputtered aluminum thin films are presented. The field emission scanning electron microscope, atomic force microscopy (AFM) and nanoindentation results are presented for films prepared at a substrate temperature ranging between 44.5 °C and 100 °C. A multifractal approach on the microstructure is presented to comprehend the micromorphology of the films. The roughness decreases, whereas fractal dimension increases as the temperature increases. The hardness and Young's modulus do not exhibit any predictable trend. Hardness and Young's modulus exhibit a linear relationship.
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