Abstract
Micromagnetic simulations were performed to describe the processes for reversal of the magnetization of ultrathin Co magnetic films on Si(1 1 1) vicinal substrates. The micromagnetic model is discussed, taking into account the following contributions to the total magnetic anisotropy energy: perpendicular uniaxial anisotropy, step-induced uniaxial in-plane anisotropy and magnetocrystalline anisotropy. There is good agreement between the results of the simulation and the experiment.
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