Abstract
Tin oxide thin film was micromachined by the electrochemical reduction process in various electrolyte solutions. The electrode gap, current density, and kind of electrolyte solutions for electrochemical reduction of tin oxide film were optimized. Very high resolution was achieved in neutral or basic solutions, when the electrode gap was 0.1 mm and a large current density such as 5 A/cm2 was applied for very short time, 1 s. High current density and very short reaction time avoided the deposition of reduced species of tin oxide on the machined area, resulting in the high resolution. Moreover, photolithographical pattern etching of five parallel straight lines with the widths 0.02–0.1 mm was performed and very high resolution was obtained when the substrate was patterned and the Pt plate was used as counter electrode.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
