Abstract
A novel micromachined X-ray collector using anisotropically etched Si(111) side walls as X-ray mirrors for future astronomical missions is reported. The collector was designed to converge a ϕ 100mm parallel X-ray beam into a ϕ 4mm focus. In order to obtain smooth Si(111) side walls, dynashock-type ultrasonic waves were added during the anisotropic KOH etching. The surface roughness on the order of nm or less was achieved. The sidewalls or the X-ray mirrors were diced from the wafer as mirror chips and then adhered to a mount formed by deep reactive ion etching. The first light image was successfully obtained at Al Kα 1.49keV in a ISAS 30m-long X-ray beam line.
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