Abstract
In this paper, we report the establishment of an experimental setup and the procedure used for metastable atom lithography. Using a helium metastable atom beam and dodecanethiol (DDT) self-assembled monolayer (SAM), we carried out the patterning of the gold film on muscovite mica having a flat surface. Large-area intact and flat patterns with a nanoscale width of ∼80–110 nm, of the etched step were obtained. From the analysis of the roughness, it was determined that no remaining gold islands were present in the area exposed to the He* atom beam under the optimized experimental parameters: 40–60 min. of exposure time and 8–10 min. of etching time. In addition, the presence of some flaws in the patterns was considered to be due to the scratches on mica substrate.
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