Abstract
We deposited polytetrafluoroethylene (PTFE) thin films both from the PTFE target by using synchrotron radiation (SR) beam and from PTFE emulsion by spin-coat process. The X-ray diffraction analyses showed a sharp peak due to (1 0 0) PTFE crystalline part, and only C–F 2 bonding was found in Fourier transform infrared spectrophotometer spectra. From electron spectroscopy for chemical analysis measurements, no impurities were found. The fabricated PTFE films were easily etched by SR beam on the limited area of the surface on a microscale through a suitably patterned mask.
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Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
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