Microfabrication of arrays of scanning electron microscopes

Abstract

Arrays of miniature scanning electron microscopes (MSEMs) can conceivably solve the low throughput rates traditionally associated with direct write lithography. An inexpensive and accurate method for fabricating arrays of electron beam columns has been proposed: horizontal surface mounted electrode sectioning (slicing). This method combines the precision of semiconductor processing and fiber optic technology to fabricate macroscopic structures consisting of charged particle sources, deflecting and focusing electrodes, and detectors. Slicing can be used to miniaturize columns operating at 10–50 kV. Voltages in this range are required to produce characteristic x rays for elemental analysis. Slicing should allow the SEM to be considerably reduced in size while preserving performance and also can be adapted to produce arrays of MSEMs. The performance of the proposed sliced columns is discussed and initial results indicate that a 15 kV sliced MSEM 8.5 mm long will have 2.2 nm resolution.