Abstract
The submicro-nanocrystalline multiphase structure of high-velocity cellular crystallization has been formed in the surface layer of AK10M2N silumin by the irradiation with the intense pulsed electron beam. According to the morphological features the crystallization cells are divided into two types. The cells of the first type are formed by the alternating plates of silicon and aluminium of nanodimensional transverse sizes by the eutectic reaction. The cells of the second type are formed by the solid solution based on aluminium and contain the nanodimensional particles of the second phase. The cells of the first and the second type are separated by the interlayers of the second phase containing the silicon particles, aluminides and copper silicides. The obtained results enable to recommend the irradiation of silumin by the intense pulsed electron beam as the method resulting in the multiple dispersion of the structure facilitating the increase in wear resistance of the material.
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