Abstract
A microdetermination method of silicon dioxide on the silicon surface is studied. In this method, a thin SiO2 layer is dissolved in an aqueous solution of hydrofluoric acid and then the resulting solution is analyzed with sensors based on perfluorinated proton-conducting membranes. Quantitative determination of silicon dioxide remaining on the silicon surface in a quantity as low as 1 × 10−6 mol is demonstrated to be feasible.
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