Abstract
An array-antenna-type very high frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) system based on a multisubstrate deposition technique has been developed for the large area (>1 m2), high-throughput and low-cost production of thin-film silicon solar cells. A hydrogenated microcrystalline silicon ( µc-Si:H) solar cell fabricated at around 20 Pa showed an initial efficiency of 7.44% for a deposition rate of 0.32 nm/s with evaporated Ag as the back contact. The uniform formation of each layer was observed, and the quantum efficiency spectrum after exposure to air indicates high-stability high-quality film formation. The advantage of the novel array antenna method is discussed in terms of the material property as well as production cost.
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