Microcontact electrochemical etching technique for rapid fabrication of glass-based microfluidic chips

Abstract

A simple and rapid microfabrication method for glass-based microfluidic chips is presented. In this method, a microcontact electrochemical etching technique is used to pattern the masking metal layer. By applying an anodic potential in the presence of KCl solution, a stamp's configuration can be precisely transferred to the masking layer within 2 min. In contrast to photolithography, the new method does not require clean room facilities and a photolithography machine, and the chemical reagent used is harmless to the environment and the human body. Combined with wet etching and thermal bonding, a microfludic device was fabricated and successfully used for electrophoretic separation of FITC. We anticipate that this fabrication method will bring glass microfluidic chips within the reach of any routine laboratory with minimal facilities. This low cost and high throughput process may also be suitable for mass production of microfluidic devices.