Abstract
AbstractThe fabrication of two-dimensional uniform arrays of microchannels in borophosphosilicate glass (BPSG) layers deposited by plasma-enhanced chemical vapor deposition (PECVD) is presented. The microchannels, with circular cross-sections of 2-3 μm diameter, are formed by depositing specific thicknesses of BPSG over periodic ridge/space templates etched into underlying silica layers using reactive ion etching (RIE). High temperature annealing results in reflow of the BPSG and the formation of uniform circular or cylindrical voids between the template ridges. Control of microchannel size and geometry through process variables is reported, and exploitation of the microfluidic and optical properties of microchannels and integrated waveguides for applications in optical sensing and photonic devices is demonstrated
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