Abstract
PbTiO 3 films grown by MOCVD on SrTiO 3 substrates were analyzed for epitaxy as a function of thickness by microbeam channeling. Micro RBS/PIXE analysis indicated all films had reasonable stoichiometric composition. The channeling minimum yield ( χ min) was close to 5% of the substrate value for very thin films indicating good epitaxial growth. Thicker films exhibited higher χ min values. Comparison of the experimental and simulated channeling spectra indicates higher defect density in thicker films. Channeling contrast microscopy (CCM) was used to get elemental maps of the surface and interface regions of the epitaxial films. Surface defects were found both in thin and thick films.
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