Abstract
A metal-silicide wiring structure with submicron lateral feature size was analyzed successfully by a nuclear microprobe with a Liquid Metal Ion Source (LMIS). A minimum beam spot size of less than 80 nm at a current of 30 pA with a 300 keV Be 2+ beam was used. The lateral distribution of WSi x at submicron level was resolved using RBS mapping and tomographic imaging. The localized silicidation behavior between WSi x on Si and on SiO 2 was compared by microbeam RBS measurement.
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