Micro Structure Observation and Reliability Behavior of Peripheral Flip Chip Interconnections with Solder-Capped Cu Pillar Bumps

Abstract

PoP (Package on Package) structures have been used widely in digital consumer electronics products such as digital still cameras and mobile phones. However, the final stack height from the top to the bottom package for these structures is higher than that of the current stacked die packages. To reduce the height of the package, a flip chip technology is used. Since the logic chips of mobile applications use a pad pitch of less than 80 μm or less, an ultra-fine-pitch flip chip interconnection technique is required. The C4 (Controlled Collapse Chip Connection) flip chip technology is widely used in area array flip chip packages. The C4 was named after the four initial characters which are C of Controlled Collapse Chip Connection. The collapse of the molten solder is controlled by the individual opening of solder resist on each pad on the substrate so that the chip can be connected onto the substrate. However, C4 is not suitable in the ultra-fine-pitch flip chips because the such a individual opening which is suitable for the ultra-fine-pitch cannot be made on the substraete. Instead of the C4 flip chip technology, the new interconnection technique was developed using the solder capped Cu pillar bumps. It is very easy to control the space between the die and the substrate by adjusting the Cu pillar height even when a large slit window opening exists on a group of pads on the substrate. Since the collapse control of the solder bumps is not necessary, we call the process C2 (Chip Connection). The C2 was named after the two initial characters which are C of Chip Connection. The solder capped Cu pillar bumps are connected to Cu substrate pads, which are a surface treated with OSP (Organic Solder Preservative), by reflow with no-clean processes. This technology creates the SMT (Surface Mount Technology)/flip chip hybrid assembly for SoP (System on Package) use. We have produced 50 μm pitch interconnections and observed the micro structure and tested their reliability. Some voids in the solder joint were observed after the reflow process. The results of warpage measurements and FEM (Finite Element Method) analyses suggest that these voids are the shrinkage voids caused by the wide temperature range of the solder liquid phase and the substrate warpage. Since they are not the stress induced voids, they didn't affect the reliability test. The increase in interconnection resistance during the reliability test was compared between the C2 interconnection and Au stud-solder interconnection. Since the resistance increase of the C2 interconnection is much smaller than that for the Au stud-solder interconnection, it is clear that the C2 flip chip technology provides robust solder connections at low cost. Also the C2 structure with a low-k device was evaluated and no failures were observed at 1,500 cycles in the TC (Thermal Cycle) test. In addition to the fine-pitch interconnections, a die thickness of 70 μm is required to reduce the final stack height. The reliability performance of the C2 flip chip with the die thicknesses 20 μm, 70 μm and 150 μm was also discussed using a PEG (Post-Encapsulation Grinding) method in which the die is ground to less than 70 μm after joining and underfilling. Finally the electromigration tests were performed on the 80 μm pitch C2 interconnection. The tests showed that the solder capped Cu pillar structure has high endurance against electromigration and no failure data was recorded up to 1,000 hrs with several electromigration conditions regardless the direction of electron flow.