Abstract
AbstractWe propose a method for studies in deph profile of porous silicon (PS) using atomic force microscopy (AFM) to remove PS layers from the surface. The abrasion were made aplying forces between 10-11 to 10-13 N with the AFM liquid cell measuring method. These range of forces is enough to remove very thin PS layers of the surface at each scan the equipment makes. With this method we can make studies and see the PS diferences in depth profile made by different process or different manufacturing conditions.
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