Abstract
Anisotropic chemical etching behavior of ZnO single crystal surface was investigated by using patterned resist masks prepared by electron beam lithography. Particularly, etching with aqueous solutions of HCl and CH 3COOH was examined for (0001¯) surface of ZnO. The obtained micro-patterns were characterized by scanning electron microscope and laser microscope. In the concave structure formation, the facets of {101¯1¯} were developed independent of the etchants. However, a roundish bottom face of the pits consisted of {101¯n¯} ( n>1) planes of ZnO was observed only in the sample etched in HCl solution. These results indicated that the resultant shape of the microstructure is strongly affected by reaction kinetics.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
