Abstract
Micropatterning of transition metal dichalcogenide (TMDC) ultrathin-films and monolayers has been demonstrated by various multi-step approaches. However, directly achieving a patterned growth of TMDC films is still considered to be challenging. Here, we report a solution-based approach for the synthesis of patterned MoS2 layers by dragging a precursor solution droplet with variable velocities across a substrate. Utilizing the pronounced shearing velocity dependence in a Landau-Levich deposition regime, MoS2 films with a spatially modulated thickness with alternating mono/bi- and few-layer regions are obtained after precursor annealing. Generally, the presented facile methodology allows for the direct preparation of micro-structured functional materials, extendable to other TMDC materials and even van der Waals heterostructures.
Highlights
Micropatterning of transition metal dichalcogenide (TMDC) ultrathin-films and monolayers has been demonstrated by various multi-step approaches
For integrating TMDC films into functional devices and complex nano architectures, various patterning and interfacing approaches have been developed such as focused ion beam (FIB) m illing[9], photo and electron beam lithography[10], and combinations of metal sputtering processes with selective etching after photolithographically defined masking[11]
One line of research focuses on the deposition of colloidal M oS2 flakes and was successfully employed for the preparation of nano-porous MoS2 films, which act, for example, as a catalyst for the hydrogen evolution reaction[19,20,21,22]
Summary
Micropatterning of transition metal dichalcogenide (TMDC) ultrathin-films and monolayers has been demonstrated by various multi-step approaches. Depending on the shearing velocity v imparted by the moving substrate, the precursor droplet is deformed and leaves a thin trailing liquid film meniscus behind.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have