Abstract
Methyl-terminated Si(1 1 1) (Me–Si(1 1 1)) and bilayer-GaSe terminated Si (BGS) surfaces were investigated to explore their usefulness as the protection layer in the fabrication process of nanometer-scale self-assembled monolayers (SAMs). BGS was not stable in the reagent involved in the alkyl SAM formation, whereas Me–Si(1 1 1) was suitable for the protection layer. Anodization using atomic force microscope (AFM) and following HF and hexadecene treatments were performed to form nano-scale alkyl SAM lines on the Me–Si(1 1 1) surface. It was found from AFM observation and frictional force measurement that only the patterned areas were selectively covered with hexadecyl SAMs.
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