Abstract
Abstract Various electrical probing and nano probing solutions are offered for semiconductor or failure analysis labs. Using a focused ion beam (FIB) instrument, it is possible to make modifications to probe tips used in optical and SEM probe stations for improved ohmic contact and probe tip durability. The other added benefit is cost reduction by being able to reconstruct damaged tips. This paper shows various FIB techniques and compares reconstructed tip performance with new probe tips.
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