Abstract
This paper is concerned with patterning of ultra-thin films formed by means of mist deposition technique using colloidal solutions of nanocrystalline quantum dots (NQDs). It discusses patterns created using mechanical masks as well as area selective bottom-up growth of quantum dot films which follows patterns created by means of pre-mist deposition surface functionalization. A new method of nanocrystalline quantum dot film patterning by means of a lift-off process is proposed and investigated. The results obtained show effectiveness of both gas-phase (oxygen plasma) and liquid-phase (acetone) based lift-off steps in forming NQD patterns with the resolution defined by the resolution of the photolithographic process used to pattern photoresist.
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