METHODS FOR PULSED LASER DEPOSITION OF LARGE-AREA FILMS USING MORE THAN ONE TARGET

Abstract

Several new methods of pulsed laser deposition for fabricating large-area thin films of uniform thickness and composition on a rotating substrate and onto a moving ribbon are proposed. The peculiarities of the methods are the laser deposition of a compound upon a substrate through a diaphragm or the mask placed in immediate proximity of the substrate together with a use of more than one target. The proposed method makes it possible to obtain thin films of uniform thickness on substrates with sizes limited only by the deposition chamber size. Some of the methods are experimentally verified by depositing CuO thin films and the deviation of the film thickness from the average value does not exceed ±3%. Given the advantage of laser deposition, the offered methods should find practical use, in particular, in micro-electronics, optical industry, development of superconducting coated conductors, deposition of thin films of functional materials and other modern technologies.