Methodological development of topographic correction in 2D/3D ToF-SIMS images using AFM images

Abstract

Time-of-flight secondary-ion mass spectrometry (ToF-SIMS) is an emerging technique that provides chemical information directly from the surface of electronic materials, e.g. OLED and solar cell. It is very versatile and highly sensitive mass spectrometric technique that provides surface molecular information with their lateral distribution as a two-dimensional (2D) molecular image. Extending the usefulness of ToF-SIMS, a 3D molecular image can be generated by acquiring multiple 2D images in a stack. These imaging techniques by ToF-SIMS provide an insight into understanding the complex structures of unknown composition in electronic material. However, one drawback in ToF-SIMS is not able to represent topographical information in 2D and 3D mapping images. To overcome this technical limitation, topographic information by ex-situ technique such as atomic force microscopy (AFM) has been combined with chemical information from SIMS that provides both chemical and physical information in one image. The key to combine two different images obtained from ToF-SIMS and AFM techniques is to develop the image processing algorithm, which performs resize and alignment by comparing the specific pixel information of each image. In this work, we present methodological development of the semiautomatic alignment and the 3D structure interpolation system for the combination of 2D/3D images obtained by ToF-SIMS and AFM measurements, which allows providing useful analytical information in a single representation.