Abstract
We have solved the problem in which a thin metal wafer (probe) with a nanohole interacts with the flat surface of a metastructured film consisting of metal nanoparticles in an external optical radiation field. Nanoparticles are considered as two-level atomic systems. This interaction of the wafer-probe and the flat surface in the external optical radiation field gives rise to optical near-field resonance, the frequency of which differs significantly from the natural frequencies of two-level atoms in the medium and the probe. The fields inside and outside the probe and metastructured film are calculated in the near-field and far-field zones. The maximum resolution, which is achievable in the suggested scheme of near-field optical microscopy, can reach about 10 nm.
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