Method of ions acceleration for laser-induced implantation of semiconductor materials

Abstract

The application of electrostatic fields for the formation of laser-generated ions makes it possible to control the ion stream parameters in broad energy and current density ranges. It also permits to remove the useless ions from the ion stream designed for laser-induced implantation and deposition of layers of semiconductor materials. For acceleration of ions a special electrostatic system has been completed and tested at the Institute of Plasma Physics and Laser Microfusion (IPPLM). A repetitive Nd: glass laser with energy of ∼0.5 J in a 3.5 ns pulse, wavelength of 1.06 μm, repetition rate of up to 10 Hz and intensity on the target of up to 1011 W cm−2, has been recently employed to produce ions emitted from irradiated solid targets. The movable target holder was located inside the cylindrical box connected with a high-voltage source (up to 50 kV). The ions passing through the diaphragm in this box were accelerated in the system of electrodes in the electrostatic field formed in the gap between the box and a grid mounted at the end of the grounded cylindrical electrode. The parameters of the ion streams were measured with the use of several ion collectors and an electrostatic ion energy analyzer (IEA). The Ge ion stream attained energy of up to 30 keV and ion fluency 1011 ions/cm2 for one laser shot. The maximum ion charge state measured with the use of IEA was 3+.