Abstract
The adsorption of methanol on γ-irradiated and un-irradiated SiO 2 surfaces pretreated at 473 K was investigated by Fourier transform infrared spectroscopy, temperature programmed desorption (TPD) and pulse methods. Methanol adsorbed only in molecular form on the un-irradiated sample. Treating the pre-irradiated silica surface with methanol at room temperature formaldehyde and hydrogen were formed. The methanol adsorbed on the irradiated silica transformed to formyl groups during a longer time at room temperature and desorbed as formaldehyde simultaneously with CH 3OH ( T max=395 K) on the TPD.
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