Abstract
Nanoarchitected materials represent a class of structural meta-materials that utilze nanoscale features to achieve unconventional material properties such as ultralow density and high energy absorption. A dearth of fabrication methods capable of producing architected materials with sub-micrometer resolution over large areas in a scalable manner exists. A fabrication technique is presented that employs holographic patterns generated by laser exposure of phase metasurface masks in negative-tone photoresists to produce 30-40 µm-thick nanoarchitected sheets with 2.1 × 2.4 cm2 lateral dimensions and ≈500 nm-wide struts organized in layered 3D brick-and-mortar-like patterns to result in ≈50-70% porosity. Nanoindentation arrays over the entire sample area reveal the out-of-plane elastic modulus to vary between 300 MPa and 4 GPa, with irrecoverable post-elastic material deformation commencing via individual nanostrut buckling, densification within layers, shearing along perturbation perimeter, and tensile cracking. Laserinduced particle impact tests (LIPIT) indicate specific inelastic energy dissipation of 0.51-2.61 MJ kg-1 , which is comparable to other high impact energy absorbing composites and nanomaterials, such as Kevlar/poly(vinyl butyral)(PVB) composite, polystyrene, and pyrolized carbon nanolattices with 23% relative density. These results demonstrate that holographic lithography offers a promising platform for scalable manufacturing of nanoarchitected materials with impact resistantcapabilities.
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