Abstract

ABSTRACTThe formation of metastable alloys by pulsed electron beam annealing of Al implanted with Sn or Ni and of Si implanted with Sn has been studied by TEM, ion backscattering and channeling. Surface segregation after pulsed melting is observed in Si but not in Al, even though all impurities have similar equilibrium distribution coefficients of∼10-2. This difference is attributed to the higher liquid-solid interface velocity and lower diffusivities in Al. Metastable substitutional solutions more than an order of magnitude above equilibrium solubilities are obtained for Ni and Sn in Al. At Ni concentrations ∼ 5 at.% a highly disordered transformation zone is formed in Al and a new phenomenon in which a polycrystalline layer forms on epitaxially regrown Al is observed.

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