Abstract

Metallic subwavelength gratings as limit-element linear array can provide the great improving output performance of optical light emitter. We investigated that the device with metallic subwavelength grating can be used to modulate the beam of edge-emitting laser with a patterned facet. Utilizing GaN-based semiconductor laser as a model system, the defined metallic subwavelength slits and gratings is a type of superior reduction method of beam divergence and coupling into other optical components effectively. We believe this study will be helpful for development of the novel light emitting devices in the blue or UV region.

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