Abstract
The paper presents the results of obtaining tantalum films with a thickness of 200– 900 nm on titanium using DC magnetron sputtering. As a result, a high-strength “Ti-base – Ta-coating” structure with a hardness of at least 2040±150 HV (20.01±1.47 GPa) was produced. The subsequent modification with high-frequency currents provided an increase in hardness to 3694±443 HV (36.23±4.35 GPa), which was associated with the formation of a thin oxide layer of TaOx with a tantalum concentration of 74.1–75.2 wt.% and oxygen of about 12.5– 13.9 wt.%.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
